Plasma Assisted Chemical Vapor Deposition
Ionbond™ PACVD coating technology
The PACVD process is used for coating a very broad range of conductive and non-conductive substrate materials at temperatures below 200 °C. The typical thickness is in the range of 2 – 3 µm. The coatings are amorphous in structure and contain around 70% sp3 bondings, which accounts for the high hardness of the coating (10-40 GPa).
What is Plasma Assisted Chemical Vapor Deposition (PACVD)?
PACVD (Plasma Assisted Chemical Vapor Deposition) is a vacuum based process used to deposit DLC (Diamond Like Carbon) coatings, also known as ADLC (Amorphous Diamond-Like Carbon). All educts of the PACVD process are gaseous. This makes it suitable for coating 3D components uniformly, without the need for rotation as is necessary in PVD.
The ideal solution for tribological systems
DLC coatings feature excellent hardness, wear and low friction properties under dry or deficient lubrication conditions. They are ideally suited for tribological systems found in engines, machines and other mechanical assemblies with sliding and rolling movements. The perfect surface finish without any post-treatment makes them ideal for high precision injection molding tools as well as for decorative purposes. DLC is chemically inert and biocompatible which allows for its application on medical components and implants.
- Broad range of substrate materials
- No distortion of high precision substrates
- No post treatment necessary
- Gaseous process for uniform coating of 3D geometries without rotation
- Green technology with respect to educts, process and products