Conventional physical and chemical vapor deposition (PVD and CVD) coatings offer only marginal improvements in corrosion resistance. This is primarily due to the coating structure, which allows interaction of the corrosive medium with the substrate through grain boundaries and other defects of the coating.
Ionbond offers a number of possible solutions to improve corrosion performance of sensitive substrates.
Aluminum coatings offer remarkable improvement in corrosion resistance. The coating acts as a sacrificial anode in galvanic corrosion, thus protecting the substrate. Ion vapor deposition (IVD) is a common method of producing such a film. Ionbond engineers have developed an alternative technique to produce Al coatings using cathodic arc or sputtering PVD techniques. The aluminum coatings produced by PVD methods fully meet strict US defense specifications (MIL-SPEC) and offer some performance advantages compared to coatings deposited by other methods.
Silicon oxide PACVD films
Another effective solution for corrosion protection is a PACVD silicon oxide film. These films are ideal for forming a completely sealed surface, effectively preventing the corrosive medium from interacting with the substrate. The SiOx coatings are produced using a pure PACVD process, thus avoiding an undesirable structure of the film. These coatings have demonstrated corrosion-free performance for up to 500 hours of the salt spray test. Unlike aluminum coatings, SiOx films have high hardness, offering some wear protection. They can be produced as a top layer on regular Tribobond™ films.